Reprospher RP und RP-Multifunktion Phasen

Silikagel Basis:Modifizierungen:  kovalent gebunden an Kieselgel
  • RP: C18 (ODS), C8 (Octyl), C4 (Butyl), Phenyl.
  • RP-Mix:  Phenyl-Hexyl, C18-Aqua, C8-Aqua, C4-Aqua.
  • Multi-Funktion: CN für RP/NP.  NH2 (Amin) und DNH (Diamin) für RP/NP/Anionaustausch.
Endcapping
:  Abbindung der freien Silanol-Gruppen des Kieselgels nach der Modifizierung Bindung an Silika  (nach Art/Anzahl der Modifizierungsgruppen pro Bindungspunkt am Kieselgel):
/100 Å

/Poren

C

/m2/g

/Endcap.

nKornn

/Phase-Nr.

/Reprospher C18 100 Å

16 %

/350

ja

1.8 µm 

rs118.9e.

 

2 µm

rs12.9e.

  2.5 µm rs125.9e.
  3 µm rs13.9e.
  4 µm rs14.9e.
  5 µm rs15.9e.
  10 µm rs10.9e.
/Reprospher C18-DE 100 Å

16 %

/350

doppelt

1.8 µm

rs118.9de.

 

2 µm

rs12.9de.

  2.5 µm rs125.9de.
  3 µm rs13.9de.
  4 µm rs14.9de.
  5 µm rs15.9de.
  10 µm rs10.9de.
 Reprospher C18-T 100 Å 20 % 350

ja

5 µm rs15.9t.
/Reprospher C18-T-DE 100 Å

20 %

/350

doppelt

3 µm 

rs13.9tde.

  5 µm rs15.9tde.
/Reprospher C18-NE 100 Å

15 %

/350

nicht

1.8 µm

rs118.90.

 

2 µm

rs12.90.

  2.5 µm rs125.90.
  3 µm rs13.90.
  5 µm rs15.90.
  10 µm rs10.90.
/Reprospher C18-Aqua   100 Å

12 %

/350

ja

1.8 µm

rs118.9aq.

    (C18/Diol) 

2 µm/p>

rs12.9aq.

  2.5 µm rs125.9aq.
  3 µm rs13.9aq.
  5 µm rs15.9aq.
  10 µm rs10.9aq.
  30 µm rs130.9aq.
/Reprospher C18-Aqua-DE   100 Å

12 %

/350

ja

3 µm

rs13.9aqd.

/Reprospher C8 100 Å

10 %

/350

ja

1.8 µm

rs118.8e.

 

2 µm

rs12.8e.

  2.5 µm rs125.8e.
  3 µm rs13.8e.
  5 µm rs15.8e.
  10 µm rs10.8e.
/Reprospher C8-DE 100 Å

10 %   

/350

doppelt

1.8 µm

rs118.8de.

 

2 µm

rs12.8de.

  2.5 µm rs125.8de.
  3 µm rs13.8de.
  5 µm rs15.8de.
  10 µm rs10.8de.
 Reprospher C8-NE 100 Å 9 % 350

nicht

5 µm

rs15.80.

/Reprospher C8-Aqua   100 Å

8 %

/350

ja

1.8 µm

rs118.8aq.

    (C8/Diol) 

2 µm

rs12.8aq.

  2.5 µm rs125.8aq.
  3 µm rs13.8aq.
  5 µm rs15.8aq.
  10 µm rs10.8aq.
/Reprospher C8-Aqua-DE 100 Å

8 %

/350

doppelt

3 µm

rs13.8aqd.

     (C8/Diol)  5 µm

rs15.8aqd.

 Reprospher C4-DE 100 Å 7 % /350

doppelt

5 µm rs15.4de.
/Reprospher C4-Aqua   100 Å

6 %

/350

ja

5 µm

rs15.4aq.

    (C4/Diol) 

10 µm

rs10.4aq.

/Reprospher Phenyl-DE         100 Å

8 %

/350

doppelt

1.8 µm

rs118.pde.

 

2 µm

rs12.pde.

  2.5 µm rs125.pde.
  3 µm rs13.pde.
  5 µm rs15.pde.
  10 µm rs10.pde.
 Reprospher Phenyl-Hexyl 100 Å 13 % 350

nicht

5 µm rs15.ph.
/Reprospher CN          100 Å

7 %

/350

ja

1.8 µm

rs118.c0.

 

2 µm

rs12.c0.

  2.5 µm rs125.c0.
  3 µm rs13.c0.
  5 µm rs15.c0.
  10 µm rs10.c0.
/Reprospher CN-DE 100 Å

7 %

/350

doppelt

5 µm

rs15.cde.

/Reprospher NH2 (Amin) 100 Å

4 %

/350

doppelt

1.8 µm

rs118.ade.

  2 µm rs12.ade.
  3 µm rs13.ade.
  5 µm rs15.ade.
  10 µm rs10.ade.
 Reprospher DNH (Diamin)  100 Å    

4 %  

 350 

ja

5 µm rs15.dnh.
200 - 300 Å  Poren C m2/g Endcap. Korn Phase-Nr. 
/Reprospher C18 300 Å

16 %

/

ja

5 µm 

rs35.9e.

/Reprospher C18-T-NE 300 Å

11 %

/

nicht

5 µm 

rs35.9tn.

/Reprospher C18-DE 200 Å

  10 %  

 

doppelt

3 µm 

rs23.9de.

/   300 Å

17 %

/

doppelt

3 µm

rs33.9de.

/   300 Å

17 %

/

doppelt

5 µm

rs35.9de.

/Reprospher C18-Aqua        200 Å

15 %

/

ja

3 µm

rs23.9aq.

/   200 Å

15 %

/

ja

5 µm

rs35.9aq.

/   300 Å

14 %

/

ja

5 µm

rs35.9aq.

/Reprospher C4-DE       300 Å

13 %

/

doppelt

3 µm

rs33.4de.

/   300 Å

13 %

/

doppelt

5 µm

rs35.4de.

/Reprospher Phenyl-DE       300 Å

15 %

/

doppelt

3 µm

rs33.pde.